Robust Plasma Immersion Ion Implantation (PIII) Treatment on Tungsten Metal Nanocrystal Nonvolatile Memory

Research output: Contribution to conference › Proceeding

Original language	American English
State	Published - 2011
Event	2011 4th IEEE International NanoElectronics Conference (IEEE INEC 2011) - Taoyuan, Taiwan Duration: 21 06 2011 → 24 06 2011

Conference	2011 4th IEEE International NanoElectronics Conference (IEEE INEC 2011)
Period	21/06/11 → 24/06/11

Cite this

@conference{2b9f201bc82a4a79b28be55f6f824910,

title = "Robust Plasma Immersion Ion Implantation (PIII) Treatment on Tungsten Metal Nanocrystal Nonvolatile Memory",

author = "Yi-Kai Liao and Pai-Chi Chou and Jer-Chyi Wang and Chao-Sung Lai and Li-Chun Cheng and Chi-Fong Ai and Wen-Fu Tsai",

year = "2011",

language = "American English",

note = "2011 4th IEEE International NanoElectronics Conference (IEEE INEC 2011) ; Conference date: 21-06-2011 Through 24-06-2011",

}

TY - CONF

T1 - Robust Plasma Immersion Ion Implantation (PIII) Treatment on Tungsten Metal Nanocrystal Nonvolatile Memory

AU - Liao, Yi-Kai

AU - Chou, Pai-Chi

AU - Wang, Jer-Chyi

AU - Lai, Chao-Sung

AU - Cheng, Li-Chun

AU - Ai, Chi-Fong

AU - Tsai, Wen-Fu

PY - 2011

Y1 - 2011

M3 - Proceeding

T2 - 2011 4th IEEE International NanoElectronics Conference (IEEE INEC 2011)

Y2 - 21 June 2011 through 24 June 2011

ER -