| Translated title of the contribution | 鍺離子先行非晶化植入在P型金屬氧化半導體場效電晶體形成淺接面摻雜 |
|---|---|
| Original language | American English |
| Supervisors/Advisors |
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| State | Published - 2006 |
| Externally published | Yes |
Shallow Junction Doping Formation on PMOSFET by Germanium Pre-Amorphization Implantation
林裕章
Research output: Types of Thesis › Master's thesis