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Soft lithographic patterning of hyaluronic acid on hydrophilic substrates using molding and printing

  • Kahp Y. Suh*
  • , Ali Khademhosseini
  • , Jen Ming Yang
  • , George Eng
  • , Robert Langer
  • *Corresponding author for this work
  • Massachusetts Institute of Technology
  • Seoul National University

Research output: Contribution to journalJournal Article peer-review

76 Scopus citations

Abstract

Hyaluronic acid (HA) was patterned using two soft lithographic methods on various substrates including glass. silicon dioxides, poly(hydroxyethyl methacrylate) [poly(HEMA)]. polystyrene cell culture dishes and biodegradable polylactic glycolic acid (PLGA). with no or minor chemical.

Original languageEnglish
Pages (from-to)584-588
Number of pages5
JournalAdvanced Materials
Volume16
Issue number7
DOIs
StatePublished - 05 04 2004

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