Stacked ALD Deposited Metal Oxide Films as Reliable Sensing Films for Organic Semiconductor- Based LAPS

Chia-Ming Yang, B. Jiang, C. Chen, Y. Yang

Research output: Contribution to conferenceProceeding

Original languageAmerican English
StatePublished - 2024
EventThe AVS 24th International Conference on Atomic Layer Deposition (ALD 2024) featuring the 11th International Atomic Layer Etching Workshop (ALE 2024) - Helsinki, Finland
Duration: 04 08 202407 08 2024

Conference

ConferenceThe AVS 24th International Conference on Atomic Layer Deposition (ALD 2024) featuring the 11th International Atomic Layer Etching Workshop (ALE 2024)
Period04/08/2407/08/24

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