Structural and Electrical Characteristics of Alternative High-k Dielectrics for CMOS Applications

Fu Chien Chiu*, Somnath Mondal, Tung Ming Pan

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingChapterpeer-review

11 Scopus citations
Original languageEnglish
Title of host publicationHigh-k Gate Dielectrics for CMOS Technology
PublisherWiley-VCH
Pages111-184
Number of pages74
ISBN (Print)9783527330324
DOIs
StatePublished - 23 08 2012

Keywords

  • Atomic force microscopy
  • High permittivity dielectric (high-k)
  • Rare-earth oxide
  • Transmission electron microscope
  • X-ray diffraction
  • X-ray photoelectron spectroscopy

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