Structural and electrical characteristics of the interfacial layer of ultrathin ZrO2 films on partially strain compensated Si 0.69Ge0.3C0.01 layers

R. Mahapatra, S. Maikap, Je Hun Lee, G. S. Kar, A. Dhar, Kim Doh-Y. Kim, D. Bhattacharya, S. K. Ray*

*Corresponding author for this work

Research output: Contribution to journal › Journal Article › peer-review

4 Scopus citations

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