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Structural and Mechanical Properties of Fluorine-Containing TaCxNy Thin Films Deposited by Reactive Magnetron Sputtering

  • J. H. Hsieh*
  • , Chuan Li*
  • , Weite Wu
  • , S. L. Liu
    • *Corresponding author for this work

Research output: Contribution to journal › Journal Article › peer-review

3 Scopus citations

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