Structural properties and sensing characteristics of thin Nd2 O3 sensing films for pH detection

Tung Ming Pan; Chao Wen Lin; Jian Chi Lin; Min Hsien Wu

doi:10.1149/1.3193552

Structural properties and sensing characteristics of thin Nd₂ O₃ sensing films for pH detection

Tung Ming Pan^*, Chao Wen Lin, Jian Chi Lin, Min Hsien Wu

^*Corresponding author for this work

Chang Gung University

Research output: Contribution to journal › Journal Article › peer-review

7 Scopus citations

Abstract

In this article, the structural properties and pH sensing characteristics of Nd₂ O₃ sensing films deposited on Si(100) substrates through reactive sputtering were reported. X-ray diffraction, X-ray photoelectron spectroscopy, and atomic force microscopy were used to explore the structural and morphological features of these films with annealing at various temperatures. We found that the Nd₂ O₃ films annealed at 700°C exhibit a higher sensitivity of 56.01 mV/pH, a lower hysteresis voltage of 4.71 mV, and a smaller drift rate of 1.34 mV/h than that of the other thermal annealing conditions.

Original language	English
Pages (from-to)	J96-J99
Journal	Electrochemical and Solid-State Letters
Volume	12
Issue number	10
DOIs	https://doi.org/10.1149/1.3193552
State	Published - 2009

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title = "Structural properties and sensing characteristics of thin Nd2 O3 sensing films for pH detection",

abstract = "In this article, the structural properties and pH sensing characteristics of Nd2 O3 sensing films deposited on Si(100) substrates through reactive sputtering were reported. X-ray diffraction, X-ray photoelectron spectroscopy, and atomic force microscopy were used to explore the structural and morphological features of these films with annealing at various temperatures. We found that the Nd2 O3 films annealed at 700°C exhibit a higher sensitivity of 56.01 mV/pH, a lower hysteresis voltage of 4.71 mV, and a smaller drift rate of 1.34 mV/h than that of the other thermal annealing conditions.",

author = "Pan, {Tung Ming} and Lin, {Chao Wen} and Lin, {Jian Chi} and Wu, {Min Hsien}",

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AU - Pan, Tung Ming

AU - Lin, Chao Wen

AU - Lin, Jian Chi

AU - Wu, Min Hsien

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Y1 - 2009

N2 - In this article, the structural properties and pH sensing characteristics of Nd2 O3 sensing films deposited on Si(100) substrates through reactive sputtering were reported. X-ray diffraction, X-ray photoelectron spectroscopy, and atomic force microscopy were used to explore the structural and morphological features of these films with annealing at various temperatures. We found that the Nd2 O3 films annealed at 700°C exhibit a higher sensitivity of 56.01 mV/pH, a lower hysteresis voltage of 4.71 mV, and a smaller drift rate of 1.34 mV/h than that of the other thermal annealing conditions.

AB - In this article, the structural properties and pH sensing characteristics of Nd2 O3 sensing films deposited on Si(100) substrates through reactive sputtering were reported. X-ray diffraction, X-ray photoelectron spectroscopy, and atomic force microscopy were used to explore the structural and morphological features of these films with annealing at various temperatures. We found that the Nd2 O3 films annealed at 700°C exhibit a higher sensitivity of 56.01 mV/pH, a lower hysteresis voltage of 4.71 mV, and a smaller drift rate of 1.34 mV/h than that of the other thermal annealing conditions.

UR - http://www.scopus.com/inward/record.url?scp=68949141483&partnerID=8YFLogxK

U2 - 10.1149/1.3193552

DO - 10.1149/1.3193552

M3 - 文章

AN - SCOPUS:68949141483

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VL - 12

SP - J96-J99

JO - Electrochemical and Solid-State Letters

JF - Electrochemical and Solid-State Letters

IS - 10

ER -

Structural properties and sensing characteristics of thin Nd₂ O₃ sensing films for pH detection

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