Structural properties of Al 2 O 3 dielectrics grown on TiN metal substrates by atomic layer deposition

Chun I. Hsieh, Tung Ming Pan*, Jian Chyi Lin, Yan Bo Peng, Tsai Yu Huang, Chang Rong Wu, Steven Shih

*Corresponding author for this work

Research output: Contribution to journal › Journal Article › peer-review

4 Scopus citations

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Material Science

Chemical Engineering