| Translated title of the contribution | 以碳離子植入於矽中來抑制硼離子暫態加速擴散 |
|---|---|
| Original language | American English |
| Supervisors/Advisors |
|
| State | Published - 2005 |
| Externally published | Yes |
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Suppression of Boron transient enhanced diffusion in Silicon by Carbon implant
- 張榮峰
Research output: Types of Thesis › Master's thesis