The Characteristics of HfTaO and HfTiO High-K Layers Deposition by Reactive Sputtering of HfTa and HfTi Binary Target

陳志欣

Research output: Types of ThesisMaster's thesis

Translated title of the contribution射頻濺鍍鉿鉭與鉿鈦二元靶材沉積高介電常數氧化層之特性研究
Original languageAmerican English
Supervisors/Advisors
  • Lai, Chao-Sung, Supervisor
StatePublished - 2008
Externally publishedYes

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