| Translated title of the contribution | 射頻濺鍍鉿鉭與鉿鈦二元靶材沉積高介電常數氧化層之特性研究 |
|---|---|
| Original language | American English |
| Supervisors/Advisors |
|
| State | Published - 2008 |
| Externally published | Yes |
The Characteristics of HfTaO and HfTiO High-K Layers Deposition by Reactive Sputtering of HfTa and HfTi Binary Target
陳志欣
Research output: Types of Thesis › Master's thesis