TY - GEN
T1 - The contact characteristics and NMOS performance of ACF-bonded Ultra-Thin Chip-on-Flex (UTCOF) interconnects for bendable electronics
AU - Lin, Yu Min
AU - Lu, Su Tsai
AU - Kao, Hsuan Ling
AU - Chen, M. T.
PY - 2010
Y1 - 2010
N2 - In this study, our main goal is to evaluate the effects of residual stress between devices and interconnections after various processes and being applied a bending load on the electrical performances. Moreover, both the Contact Characteristics and metal-oxide-semiconductor field-effect transistor (NMOSFET) NMOS Performance of ACF-Bonded ultra-thin chip-on-olex (UTCOF) Interconnects under bending load are also investigated, a chip with n-type MOSFET was applied to UTCOF package. Firstly, gold stud bumping process was carried out on the NMOS wafer. Then, this wafer was thinning to about 50 μm in thickness. Finally, thin chip was flip- chip bonded onto PI substrate with ACF. Direct current (DC) characteristics of devices were measured after following processes: before bumping, after bumping, after DBG, after bonding, after bending and 85 °C / 85 % RH thermal humidity storage test (THST). The electrical performances of ACF joints were also monitored by measuring contact resistance. The effect of various processes could be quantified from the value of NMOS and contact resistance of ACF joints. Compared with UTCOF samples, a face-up ultra thin chip (UTC) was also laminated onto PET films. After package and lamination process, the THST test was performed under bending. The electrical performance of ACF joints and functionality of NMOS in the UTCOF interconnects have been measured before and after THST reliability test. Based on the results, process-induced residual stress effect is confirmed. The electrical characteristics and failure sequences between devices and joints in the UTCOF during bending and reliability test are understood.
AB - In this study, our main goal is to evaluate the effects of residual stress between devices and interconnections after various processes and being applied a bending load on the electrical performances. Moreover, both the Contact Characteristics and metal-oxide-semiconductor field-effect transistor (NMOSFET) NMOS Performance of ACF-Bonded ultra-thin chip-on-olex (UTCOF) Interconnects under bending load are also investigated, a chip with n-type MOSFET was applied to UTCOF package. Firstly, gold stud bumping process was carried out on the NMOS wafer. Then, this wafer was thinning to about 50 μm in thickness. Finally, thin chip was flip- chip bonded onto PI substrate with ACF. Direct current (DC) characteristics of devices were measured after following processes: before bumping, after bumping, after DBG, after bonding, after bending and 85 °C / 85 % RH thermal humidity storage test (THST). The electrical performances of ACF joints were also monitored by measuring contact resistance. The effect of various processes could be quantified from the value of NMOS and contact resistance of ACF joints. Compared with UTCOF samples, a face-up ultra thin chip (UTC) was also laminated onto PET films. After package and lamination process, the THST test was performed under bending. The electrical performance of ACF joints and functionality of NMOS in the UTCOF interconnects have been measured before and after THST reliability test. Based on the results, process-induced residual stress effect is confirmed. The electrical characteristics and failure sequences between devices and joints in the UTCOF during bending and reliability test are understood.
UR - https://www.scopus.com/pages/publications/79951617290
U2 - 10.1109/IMPACT.2010.5699624
DO - 10.1109/IMPACT.2010.5699624
M3 - 会议稿件
AN - SCOPUS:79951617290
SN - 9781424497836
T3 - International Microsystems Packaging Assembly and Circuits Technology Conference, IMPACT 2010 and International 3D IC Conference, Proceedings
BT - International Microsystems Packaging Assembly and Circuits Technology Conference, IMPACT 2010 and International 3D IC Conference, Proceedings
T2 - 2010 5th International Microsystems, Packaging, Assembly and Circuits Technology Conference, IMPACT 2010 and International 3D IC Conference
Y2 - 20 October 2010 through 22 October 2010
ER -