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The defect structure of CuInS2. part II: Thermal annealing defects

  • H. Y. Ueng*
  • , H. L. Hwang
  • *Corresponding author for this work
  • National Sun Yat-sen University
  • National Tsing Hua University

Research output: Contribution to journalJournal Article peer-review

23 Scopus citations

Abstract

Combining the studies of electrical, photoluminescence and stoichiometric analyses, the incorporation of indium and sulfur into CuInS2 was studied, and the results were correlated with calculated data based on defect chemistry. The carrier concentration varies as K'P 1 3In + K'P 1 2In. The indium atomic inter-diffusion in CuInS2 is dominated by (1) a vacancy mechanism at low indium pressure, and (2) an interstitial mechanism at high indium pressure. The carrier concentration introduced by indium annealing depends on the stoichiometry of each sample and the annealing period, and these two factors may become unimportant in the high indium pressure region.

Original languageEnglish
Pages (from-to)1-10
Number of pages10
JournalJournal of Physics and Chemistry of Solids
Volume51
Issue number1
DOIs
StatePublished - 1990
Externally publishedYes

Keywords

  • CuInS
  • defect model
  • indium annealing
  • sulfur annealing

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