| Translated title of the contribution | 射頻濺鍍沉積三氧化二釔與三氧化二釹閘介電層之電性及物性研究 |
|---|---|
| Original language | American English |
| Supervisors/Advisors |
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| State | Published - 2006 |
| Externally published | Yes |
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The electrical characteristics and physical properties of thin yttrium oxide and neodymium oxide gate dielectrics by reactive RF-sputtering
- 李建德
Research output: Types of Thesis › Master's thesis