The Electrical Characteristics of Polysilicon Oxide Grown in Pure N2O

Chao Sung Lai, Tan Fu Lei, Chung Len Lee

Research output: Contribution to journalJournal Article peer-review

22 Scopus citations

Abstract

N20 was used to grow silicon polyoxide. It was found that the N20-grown polyoxide had a lower leakage current but a higher breakdown field when the top-electrode was positively biased. This is opposite to that of conventional O2 -grown poly oxide. Moreover, it had less electron trapping when stressed and a larger charge-to-breakdown.

Original languageEnglish
Pages (from-to)385-386
Number of pages2
JournalIEEE Electron Device Letters
Volume16
Issue number9
DOIs
StatePublished - 09 1995
Externally publishedYes

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