Abstract
N20 was used to grow silicon polyoxide. It was found that the N20-grown polyoxide had a lower leakage current but a higher breakdown field when the top-electrode was positively biased. This is opposite to that of conventional O2 -grown poly oxide. Moreover, it had less electron trapping when stressed and a larger charge-to-breakdown.
Original language | English |
---|---|
Pages (from-to) | 385-386 |
Number of pages | 2 |
Journal | IEEE Electron Device Letters |
Volume | 16 |
Issue number | 9 |
DOIs | |
State | Published - 09 1995 |
Externally published | Yes |