The electrical characteristics of thin gadolinium oxide films on silicon substrate by DC reactive RF-sputtering

Tung Ming Pan; Chao Sung Lai; Hui Hsin Hsu; Jer Chyi Wang; Kuan Di Wang; Chun Lin Chen; Jian Chi Lin; Jian Der Lee

The electrical characteristics of thin gadolinium oxide films on silicon substrate by DC reactive RF-sputtering

Tung Ming Pan^*, Chao Sung Lai, Hui Hsin Hsu, Jer Chyi Wang, Kuan Di Wang, Chun Lin Chen, Jian Chi Lin, Jian Der Lee

^*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Original language	English
Title of host publication	2005 International Semiconductor Device Research Symposium
Pages	132-133
Number of pages	2
State	Published - 2005
Event	2005 International Semiconductor Device Research Symposium - Bethesda, MD, United States Duration: 07 12 2005 → 09 12 2005

Publication series

Name	2005 International Semiconductor Device Research Symposium
Volume	2005

Conference

Conference	2005 International Semiconductor Device Research Symposium
Country/Territory	United States
City	Bethesda, MD
Period	07/12/05 → 09/12/05

Cite this

Pan, T. M., Lai, C. S., Hsu, H. H., Wang, J. C., Wang, K. D., Chen, C. L., Lin, J. C., & Lee, J. D. (2005). The electrical characteristics of thin gadolinium oxide films on silicon substrate by DC reactive RF-sputtering. In 2005 International Semiconductor Device Research Symposium (pp. 132-133). Article 1596015 (2005 International Semiconductor Device Research Symposium; Vol. 2005).

@inproceedings{db6678ce678143e6a2fdde5ba8be0a39,

title = "The electrical characteristics of thin gadolinium oxide films on silicon substrate by DC reactive RF-sputtering",

author = "Pan, {Tung Ming} and Lai, {Chao Sung} and Hsu, {Hui Hsin} and Wang, {Jer Chyi} and Wang, {Kuan Di} and Chen, {Chun Lin} and Lin, {Jian Chi} and Lee, {Jian Der}",

year = "2005",

language = "英语",

isbn = "1424400848",

series = "2005 International Semiconductor Device Research Symposium",

pages = "132--133",

booktitle = "2005 International Semiconductor Device Research Symposium",

note = "2005 International Semiconductor Device Research Symposium ; Conference date: 07-12-2005 Through 09-12-2005",

}

Pan, TM, Lai, CS, Hsu, HH, Wang, JC, Wang, KD, Chen, CL, Lin, JC & Lee, JD 2005, The electrical characteristics of thin gadolinium oxide films on silicon substrate by DC reactive RF-sputtering. in 2005 International Semiconductor Device Research Symposium., 1596015, 2005 International Semiconductor Device Research Symposium, vol. 2005, pp. 132-133, 2005 International Semiconductor Device Research Symposium, Bethesda, MD, United States, 07/12/05.

The electrical characteristics of thin gadolinium oxide films on silicon substrate by DC reactive RF-sputtering. / Pan, Tung Ming; Lai, Chao Sung; Hsu, Hui Hsin et al.
2005 International Semiconductor Device Research Symposium. 2005. p. 132-133 1596015 (2005 International Semiconductor Device Research Symposium; Vol. 2005).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - The electrical characteristics of thin gadolinium oxide films on silicon substrate by DC reactive RF-sputtering

AU - Pan, Tung Ming

AU - Lai, Chao Sung

AU - Hsu, Hui Hsin

AU - Wang, Jer Chyi

AU - Wang, Kuan Di

AU - Chen, Chun Lin

AU - Lin, Jian Chi

AU - Lee, Jian Der

PY - 2005

Y1 - 2005

UR - http://www.scopus.com/inward/record.url?scp=33847192498&partnerID=8YFLogxK

M3 - 会议稿件

AN - SCOPUS:33847192498

SN - 1424400848

SN - 9781424400843

T3 - 2005 International Semiconductor Device Research Symposium

SP - 132

EP - 133

BT - 2005 International Semiconductor Device Research Symposium

T2 - 2005 International Semiconductor Device Research Symposium

Y2 - 7 December 2005 through 9 December 2005

ER -

The electrical characteristics of thin gadolinium oxide films on silicon substrate by DC reactive RF-sputtering

Publication series

Conference

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