The field emission characteristics of carbon nanotubes coated by boron nitride film

C. Y. Su; Z. Y. Juang; Y. L. Chen; K. C. Leou; C. H. Tsai

doi:10.1016/j.diamond.2006.11.090

The field emission characteristics of carbon nanotubes coated by boron nitride film

C. Y. Su, Z. Y. Juang^*, Y. L. Chen, K. C. Leou, C. H. Tsai

^*Corresponding author for this work

National Tsing Hua University

Research output: Contribution to journal › Journal Article › peer-review

28 Scopus citations

Abstract

The field emission (FE) characteristics of boron nitride (BN) film deposition on the individual and vertically aligned carbon nanotube (CNT) were investigated. In this work, the CNTs were deposited with BN film by both magnetron sputtering and plasma-assisted chemical vapor deposition (PACVD) methods. The field emission (FE) characteristics measured after the BN film deposition revealed that the turn-on field was significantly reduced and the maximum emission current increased by two orders of magnitude higher than that of bare CNT with a proper deposition thickness. The experimental results show that with different deposited conditions, the thickness has significant effects on the FE characteristics. In addition, from the measured turn-on filed and as defined field enhancement factor, CNTs with sputter-deposited BN film demonstrated better FE performance than those with BN deposited by PACVD.

Original language	English
Pages (from-to)	1393-1397
Number of pages	5
Journal	Diamond and Related Materials
Volume	16
Issue number	4-7 SPEC. ISS.
DOIs	https://doi.org/10.1016/j.diamond.2006.11.090
State	Published - 04 2007
Externally published	Yes

Keywords

Boron nitride
Carbon nanotubes
Field emission
PACVD
Raman spectroscopy
Turn-on field

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10.1016/j.diamond.2006.11.090

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@article{e35358359f684977b0ec24b422f41e7a,

title = "The field emission characteristics of carbon nanotubes coated by boron nitride film",

abstract = "The field emission (FE) characteristics of boron nitride (BN) film deposition on the individual and vertically aligned carbon nanotube (CNT) were investigated. In this work, the CNTs were deposited with BN film by both magnetron sputtering and plasma-assisted chemical vapor deposition (PACVD) methods. The field emission (FE) characteristics measured after the BN film deposition revealed that the turn-on field was significantly reduced and the maximum emission current increased by two orders of magnitude higher than that of bare CNT with a proper deposition thickness. The experimental results show that with different deposited conditions, the thickness has significant effects on the FE characteristics. In addition, from the measured turn-on filed and as defined field enhancement factor, CNTs with sputter-deposited BN film demonstrated better FE performance than those with BN deposited by PACVD.",

keywords = "Boron nitride, Carbon nanotubes, Field emission, PACVD, Raman spectroscopy, Turn-on field",

author = "Su, {C. Y.} and Juang, {Z. Y.} and Chen, {Y. L.} and Leou, {K. C.} and Tsai, {C. H.}",

year = "2007",

month = apr,

doi = "10.1016/j.diamond.2006.11.090",

language = "英语",

volume = "16",

pages = "1393--1397",

journal = "Diamond and Related Materials",

issn = "0925-9635",

publisher = "Elsevier B.V.",

number = "4-7 SPEC. ISS.",

}

TY - JOUR

T1 - The field emission characteristics of carbon nanotubes coated by boron nitride film

AU - Su, C. Y.

AU - Juang, Z. Y.

AU - Chen, Y. L.

AU - Leou, K. C.

AU - Tsai, C. H.

PY - 2007/4

Y1 - 2007/4

N2 - The field emission (FE) characteristics of boron nitride (BN) film deposition on the individual and vertically aligned carbon nanotube (CNT) were investigated. In this work, the CNTs were deposited with BN film by both magnetron sputtering and plasma-assisted chemical vapor deposition (PACVD) methods. The field emission (FE) characteristics measured after the BN film deposition revealed that the turn-on field was significantly reduced and the maximum emission current increased by two orders of magnitude higher than that of bare CNT with a proper deposition thickness. The experimental results show that with different deposited conditions, the thickness has significant effects on the FE characteristics. In addition, from the measured turn-on filed and as defined field enhancement factor, CNTs with sputter-deposited BN film demonstrated better FE performance than those with BN deposited by PACVD.

AB - The field emission (FE) characteristics of boron nitride (BN) film deposition on the individual and vertically aligned carbon nanotube (CNT) were investigated. In this work, the CNTs were deposited with BN film by both magnetron sputtering and plasma-assisted chemical vapor deposition (PACVD) methods. The field emission (FE) characteristics measured after the BN film deposition revealed that the turn-on field was significantly reduced and the maximum emission current increased by two orders of magnitude higher than that of bare CNT with a proper deposition thickness. The experimental results show that with different deposited conditions, the thickness has significant effects on the FE characteristics. In addition, from the measured turn-on filed and as defined field enhancement factor, CNTs with sputter-deposited BN film demonstrated better FE performance than those with BN deposited by PACVD.

KW - Boron nitride

KW - Carbon nanotubes

KW - Field emission

KW - PACVD

KW - Raman spectroscopy

KW - Turn-on field

UR - http://www.scopus.com/inward/record.url?scp=34047276629&partnerID=8YFLogxK

U2 - 10.1016/j.diamond.2006.11.090

DO - 10.1016/j.diamond.2006.11.090

M3 - 文章

AN - SCOPUS:34047276629

SN - 0925-9635

VL - 16

SP - 1393

EP - 1397

JO - Diamond and Related Materials

JF - Diamond and Related Materials

IS - 4-7 SPEC. ISS.

ER -

The field emission characteristics of carbon nanotubes coated by boron nitride film

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Keywords

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