| Translated title of the contribution | 高介電常數三氧化二鉺和鈦摻雜三氧化二鉺的介電層應用於銦鎵鋅氧化物薄膜快閃記憶電晶體 |
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| Original language | American English |
| Supervisors/Advisors |
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| State | Published - 2015 |
| Externally published | Yes |
The structural and electrical properties of high-k Er2O3 and Ti-doped Er2O3 dielectric films for InGaZnO thin-film transistors flash memory devices
胡益祥
Research output: Types of Thesis › Master's thesis