| Translated title of the contribution | 使用四氟化碳電漿處理三氧化鉬之電荷捕捉層在快閃記憶體之應用 |
|---|---|
| Original language | American English |
| Supervisors/Advisors |
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| State | Published - 2013 |
| Externally published | Yes |
The Study of MoO3 Charge Trapping Layer with CF4 Plasma Treatment in Flash Memory Applications.
陳思謙
Research output: Types of Thesis › Master's thesis