| Translated title of the contribution | 利用氮化濺鍍調節鉬金屬堆疊閘極之臨界電位 |
|---|---|
| Original language | American English |
| Supervisors/Advisors |
|
| State | Published - 2003 |
| Externally published | Yes |
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The Threshold Voltage Adjustment of Molybdenum Metal Stack Gate by Nitrogen-Controlled Sputtering
- 楊盛耀
Research output: Types of Thesis › Master's thesis