Top gate graphene field effect transistor on flexible substrate by using one-step fluorinated graphene as dielectrics

Mamina Sahoo, Fei-Hou, Zhiwei Liu, Chao Sung Lai

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

In this study, we perform a top gate field effect transistor by using the integration of novel materials such as graphene as active channel and fluorinated graphene as dielectrics on flexible Polyethylene terephthalate (PET) substrate. These device shows high carrier mobility (∼969 cm2/v.s) at a drain bias of +0.5V. It shows good mechanical flexibility and electrical stability after bending measurement under modest strain upto 15% with different bending cycles. This result reveals the benefits of using 2D material that is graphene and fluorinated graphene for flexible electronics devices.

Original languageEnglish
Title of host publication24th International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA 2017
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages1-4
Number of pages4
ISBN (Electronic)9781538617793
DOIs
StatePublished - 05 10 2017
Event24th International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA 2017 - Chengdu, China
Duration: 04 07 201707 07 2017

Publication series

NameProceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA
Volume2017-July

Conference

Conference24th International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA 2017
Country/TerritoryChina
CityChengdu
Period04/07/1707/07/17

Bibliographical note

Publisher Copyright:
© 2017 IEEE.

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