Transmission electron microscopy analysis of "black belt:" The masking film of white ribbon of Kooi effect in the local oxidation of silicon process

Tan Tsu Sheng; Chih Yuan Lu; Ruey Dar Chang; Song Tsan Chiang

doi:10.1063/1.356057

Transmission electron microscopy analysis of "black belt:" The masking film of white ribbon of Kooi effect in the local oxidation of silicon process

Tan Tsu Sheng^*
, Chih Yuan Lu
, Ruey Dar Chang
, Song Tsan Chiang

^*Corresponding author for this work

Industrial Technology Research Institute of Taiwan

Research output: Contribution to journal › Journal Article › peer-review

2 Scopus citations

Abstract

The first direct observation of the top view of micromasking film on the Si surface to gate oxidation in the local oxidation of silicon process with transmission electron microscopy (TEM) has been made. The micromasking film looks like an "eyelash" in cross-sectional transmission electron microscopy and like a "black belt" in top view TEM. In addition, direct and sequential TEM observations on the removal of the micromasking film by sacrificial oxidation were presented.

Original language	English
Pages (from-to)	3810-3813
Number of pages	4
Journal	Journal of Applied Physics
Volume	75
Issue number	8
DOIs	https://doi.org/10.1063/1.356057
State	Published - 1994
Externally published	Yes

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10.1063/1.356057

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title = "Transmission electron microscopy analysis of {"}black belt:{"} The masking film of white ribbon of Kooi effect in the local oxidation of silicon process",

abstract = "The first direct observation of the top view of micromasking film on the Si surface to gate oxidation in the local oxidation of silicon process with transmission electron microscopy (TEM) has been made. The micromasking film looks like an {"}eyelash{"} in cross-sectional transmission electron microscopy and like a {"}black belt{"} in top view TEM. In addition, direct and sequential TEM observations on the removal of the micromasking film by sacrificial oxidation were presented.",

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year = "1994",

doi = "10.1063/1.356057",

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AU - Sheng, Tan Tsu

AU - Lu, Chih Yuan

AU - Chang, Ruey Dar

AU - Chiang, Song Tsan

PY - 1994

Y1 - 1994

N2 - The first direct observation of the top view of micromasking film on the Si surface to gate oxidation in the local oxidation of silicon process with transmission electron microscopy (TEM) has been made. The micromasking film looks like an "eyelash" in cross-sectional transmission electron microscopy and like a "black belt" in top view TEM. In addition, direct and sequential TEM observations on the removal of the micromasking film by sacrificial oxidation were presented.

AB - The first direct observation of the top view of micromasking film on the Si surface to gate oxidation in the local oxidation of silicon process with transmission electron microscopy (TEM) has been made. The micromasking film looks like an "eyelash" in cross-sectional transmission electron microscopy and like a "black belt" in top view TEM. In addition, direct and sequential TEM observations on the removal of the micromasking film by sacrificial oxidation were presented.

UR - https://www.scopus.com/pages/publications/36448999219

U2 - 10.1063/1.356057

DO - 10.1063/1.356057

M3 - 文章

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SN - 0021-8979

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SP - 3810

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JO - Journal of Applied Physics

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ER -

Transmission electron microscopy analysis of "black belt:" The masking film of white ribbon of Kooi effect in the local oxidation of silicon process

Abstract

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