摘要
A high-isolation high-linearity GaAs pseudomorphic high-electron mobility transistor single-pole-double-throw microwave switch was developed using a tunable field-plate (FP) bias voltage technology. In this paper, a piece of FP metal was deposited between 0.15-μm-long gate and drain terminals. An extra FP-induced depletion region was generated to suppress the harmonics of switching associated with off-state operation. When switching into the on-state, the FP switch is associated with an insertion loss similar to that of the standard switch below 6 GHz. However, the isolation performance can be enhanced by 10 dB using an FP technology, which reduces the off-state capacitance that is produced by the extra FP-induced depletion region. The FP provides an additional mechanism to suppress the power of the second- and third-order harmonics in the off-state with slight on-state insertion-loss degradation.
| 原文 | 英語 |
|---|---|
| 頁(從 - 到) | 541-545 |
| 頁數 | 5 |
| 期刊 | IEEE Transactions on Electron Devices |
| 卷 | 56 |
| 發行號 | 4 |
| DOIs | |
| 出版狀態 | 已出版 - 2009 |
指紋
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