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An environmentally friendly etching agent: Vapor from hot electron-activated liquid water

  • Hsiao Chien Chen
  • , Fu Der Mai
  • , Kuang Hsuan Yang
  • , Hui Yen Tsai
  • , Chih Ping Yang
  • , Chien Chung Chen
  • , Chao Hsuan Chen
  • , Yu Chuan Liu*
  • *此作品的通信作者
  • Taipei Medical University
  • Vanung University Taiwan

研究成果: 期刊稿件文章同行評審

18 引文 斯高帕斯(Scopus)

摘要

A novel strategy for an environmentally friendly etching process is proposed based on the vapor from hot electron-activated (HEA) water, in which, HEA water with a weakly hydrogen-bonded structure is neutral. Compared to the vapor from deionized (DI) water, the vapor from HEA water exhibits a facile etching process to a glass sheet after exposing it to vapor at room temperature. The etched glass sheet demonstrates a granular surface morphology with a hydrophobic structure. In addition, the resulting nanostructured glass shows a uniform signal intensity of surface-enhanced Raman scattering (SERS) of rhodamine 6G (R6G). This is favorable for developing reliable sensors. The adhesion of deposited metals on the etched glass is also enhanced. Furthermore, the distortion and reformation of the deposited gold nanoparticles (AuNPs) by vapor from HEA water were observed. It suggests that this vapor has higher energy than conventional DI water does. This innovative concept has emerged as a promising strategy for environmentally friendly nanostructured etching.

原文英語
頁(從 - 到)3098-3105
頁數8
期刊Green Chemistry
18
發行號10
DOIs
出版狀態已出版 - 2016
對外發佈

文獻附註

Publisher Copyright:
© The Royal Society of Chemistry 2016.

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