Characterization of Cu₂O and Cu₂O-Ag₂O thin films synthesized by plasma oxidation

Chemistry

• Liquid Film 100%
• Oxidation Reaction 100%
• Copper(II) Oxide 100%
• Plasma 100%
• Rate 42%
• Structure 28%
• Sample 14%
• Photocurrent 14%
• Inductively Coupled Plasma 14%
• Density 14%
• Electrical Property 14%
• Band Gap 14%
• Dioxygen 14%
• Electron-Hole Pair 14%
• Oxidation Reaction 14%
• Oxygen Radical 14%

Physics

• Oxidation 100%
• Thin Films 100%
• Ratios 40%
• Oxygen 40%
• Variations 20%
• Deposition 20%
• Gaps 20%
• Photoelectric Emission 20%
• Spectrometer 20%
• Growth Rate 20%
• Electrical Properties 20%
• Probe 20%
• Photon Conversion 20%
• Electromagnetic Absorption 20%
• Light Emission 20%
• Plasma Density 20%
• Holes (Electron Deficiencies) 20%
• Plasma System 20%
• Antenna 20%
• Narrowband 20%