Characterization of Pr2O3 added metals/GaAs Schottky diodes using X-ray photoelectron spectroscopy

Hung Thung Wang*, Liann Be Chang, Yi Chang Cheng, Yin Kwang Lin, Chung I.G. Hsu

*此作品的通信作者

研究成果: 期刊稿件文章同行評審

2 引文 斯高帕斯(Scopus)

摘要

In this research, the surface chemical structures of Pr2O3 doped Liquid Phase Epitaxy (LPE) layers were investigated by X-ray Photoelectron Spectroscopy (XPS). The bonding energies of these grown surfaces are studied under various adding conditions. The comparisons of these surface chemical structures were used to explain the evolutions of the grown surfaces with their effects on the Schottky barrier height. Because the surface states are lowered and the Fermi level is not pinned, these metals (Au, Ag, Ni, Pt)/GaAs Schottky structures all show an improved diode performance by adding Pr2O3. The resulting barrier height and ideality factor, as estimated by the current-voltage measurement, can be as high as 0.94±0.02 eV and as unitary as 1.03±0.01, respectively.

原文英語
頁(從 - 到)1017-1021
頁數5
期刊Crystal Research and Technology
34
發行號8
DOIs
出版狀態已出版 - 1999
對外發佈

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