摘要
The IMC-PID tuning rules reduce the tuning process to the selection of one tuning parameter as opposed to three. In addition, the single parameter is directly related to the closed-loop speed of response and robustness. Process models can be developed directly from open-loop tests or combinations of tests and first-principle equations. Disturbance rejection can be significantly improved for long time-constant-to-deadtime processes by assuming they are deadtime-plus-integrator forms. Finally, the rules are being successfully applied to industrial processes. The first example given illustrated how the application of the rules quickly led to high-quality tuning parameters for a troublesome level control loop. The second illustrated how the rules were applied to obtain very responsive tuning for control of composition for a high-purity distillation column.
| 原文 | 英語 |
|---|---|
| 頁(從 - 到) | 33-41 |
| 頁數 | 9 |
| 期刊 | Chemical Engineering Progress |
| 卷 | 86 |
| 發行號 | 10 |
| 出版狀態 | 已出版 - 10 1990 |
| 對外發佈 | 是 |
指紋
深入研究「Consider IMC tuning to improve controller performance」主題。共同形成了獨特的指紋。引用此
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