摘要
Ultra large and single-layer graphene oxide sheets (up to millimeter in lateral size) are obtained by a modified Hummers' method, where we replace the first aggressive oxidation process with a short sonication step in H 2SO4 solutions. The lateral size of obtained GO sheets can be adjusted by the sonication period: it decreases with the increasing sonication time. The thin-film electrodes made from ultra large reduced GO sheets exhibit lower sheet resistance compared with those from small-size reduced GO sheets. Moreover, the transistor devices made from these single-layer GO sheets after 800 °C thermal reduction exhibit the effective hole mobility ranged between 4 and 12 cm2/(V s). Raman spectroscopic results suggest that the enhancement in mobility at a higher-mobility regime is well explained by the graphitization of GO rather than the removal of functional groups. The ratio between the 2D and G peak areas, I(2D)//(G), is well correlated to the effective hole mobility values in reduced GO sheets.
| 原文 | 英語 |
|---|---|
| 頁(從 - 到) | 5674-5680 |
| 頁數 | 7 |
| 期刊 | Chemistry of Materials |
| 卷 | 21 |
| 發行號 | 23 |
| DOIs | |
| 出版狀態 | 已出版 - 08 12 2009 |
| 對外發佈 | 是 |
指紋
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