Energy-band engineering and characterization improvements by fluorine incorporation on Gd2O3 nanocrystal memory

Chao Sung Lai*, Chih Ting Lin, Jer Chyi Wang, Chu Fa Chan

*此作品的通信作者

研究成果: 圖書/報告稿件的類型會議稿件同行評審

摘要

As a potential candidate for future nonvolatile memory (NVM) application, the discrete charge storage nodes formed as the nanocrystal (NC) structure has been caught much attention. Among the NC materials, high-k metal oxide is the unique one due to the mixed chemical reactions during high temperature forming process. The over-view of gadolinium oxide nanocrystal (Gd2O 3-NC) memory is revealed in this paper. Gd2O 3-NC was formed by one step rapid thermal annealing treated on the amorphous Gd2O3 film prepared by sputter system. The optical tests were conducted to exam the bandgap value of the Gd 2O3-NC and the x-ray tests were conducted to exam the valence band offset. The charge trapping phenomenon can be characterized by the retention tests for various temperatures. Forming gas annealing was treated on the Gd2O3-NC to passivate the deep traps. A band engineered method by CF4 plasma treatment was also conducted to improve the memory characteristics.

原文英語
主出版物標題ICSICT 2012 - 2012 IEEE 11th International Conference on Solid-State and Integrated Circuit Technology, Proceedings
DOIs
出版狀態已出版 - 2012
事件2012 IEEE 11th International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2012 - Xi'an, 中國
持續時間: 29 10 201201 11 2012

出版系列

名字ICSICT 2012 - 2012 IEEE 11th International Conference on Solid-State and Integrated Circuit Technology, Proceedings

Conference

Conference2012 IEEE 11th International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2012
國家/地區中國
城市Xi'an
期間29/10/1201/11/12

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