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Graphene reduction dynamics unveiled

  • Hung Chieh Tsai
  • , Hung Wei Shiu
  • , Min Chiang Chuang
  • , Chia Hao Chen
  • , Ching Yuan Su
  • , Jonathon David White
  • , Wei Yen Woon
  • National Central University
  • National Synchrotron Radiation Research Center Taiwan
  • Yuan Ze University

研究成果: 期刊稿件 › 文章 › 同行評審

9 引文 斯高帕斯(Scopus)

摘要

The reduction dynamics of micron-sized defects created on chemical vapor deposition-(CVD) grown graphene through scanning probe lithography (SPL) is reported here. CVD-grown graphene was locally oxidized using SPL and subsequently reduced, making use of a focused beam of soft x-rays. During this whole process, the reduction dynamics was monitored using a combination of micro-Raman spectroscopy (μ-RS) and micro-x-ray photoelectron spectroscopy (μ-XPS). After x-ray reduction, the graphene film was found to be chemically identical (μ-XPS) but structurally different (μ-RS) from the original graphene. During reduction the population of C. Cbonds was found to first increase dramatically and then decrease exponentially. By modeling the dynamics of the C=O→C. O→C-C→C=C reduction process with four coupled-rate equations and three rate constants, the conversion from C-Cto C=C bonds was found to be the limiting rate.

原文英語
文章編號31003
期刊2D Materials
卷2
發行號3
DOIs
出版狀態已出版 - 06 08 2015
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© 2015 IOP Publishing Ltd.

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