High-k HfxGdyOz charge trapping layer in silicon-oxide-nitride-silicon type nonvolatile memory by in situ radio frequency dual-sputtering method
Pai Chi Chou*, Chao Sung Lai, Jer Chyi Wang, Woei Cherng Wu, Li Chi Liu, Yu Ching Fang, Li Hsu, Hui Chun Wang
*此作品的通信作者
研究成果: 期刊稿件 › 文章 › 同行評審