跳至主導覽 跳至搜尋 跳過主要內容

High photocurrent and high frequency response of light-addressable potentiometrie sensor with thin Si substrate and surface roughness

  • Chang Gung University

研究成果: 圖書/報告稿件的類型會議稿件同行評審

4 引文 斯高帕斯(Scopus)

摘要

For two dimensional (2D) chemical images by light-addressable potentiometric sensor (LAPS), high photocurrent obtained in high ac frequency is the most critical criterion to have an acceptable signal-to-noise ratio in a very short time for a pixel. A simple KOH etch can be used to decrease the thickness of silicon substrate for high photocurrent. In the meantime, higher surface roughness in both sides could be achieved by etching flat surface, which is also benefit for high photocurrent and pH sensitivity for rough back and front side, respectively. With this 175μm-thick Si substrate, operating at 20 kHz could be used to collect 2D chemical images easily.

原文英語
主出版物標題2015 IEEE SENSORS - Proceedings
發行者Institute of Electrical and Electronics Engineers Inc.
ISBN(電子)9781479982028
DOIs
出版狀態已出版 - 31 12 2015
事件14th IEEE SENSORS - Busan, 韓國
持續時間: 01 11 201504 11 2015

出版系列

名字2015 IEEE SENSORS - Proceedings

Conference

Conference14th IEEE SENSORS
國家/地區韓國
城市Busan
期間01/11/1504/11/15

文獻附註

Publisher Copyright:
© 2015 IEEE.

指紋

深入研究「High photocurrent and high frequency response of light-addressable potentiometrie sensor with thin Si substrate and surface roughness」主題。共同形成了獨特的指紋。

引用此