跳至主導覽 跳至搜尋 跳過主要內容

High Thermal Dissipation of Normally off p-GaN Gate AlGaN/GaN HEMTs on 6-inch N-doped Low Resistivity SiC Substrate

  • Chang Gung University

研究成果: 圖書/報告稿件的類型會議稿件同行評審

摘要

Efficient heat removal through the substrate is required in high-power operation of AlGaN/GaN high-electron-mobility transistors (HEMTs). Thus, an SiC substrate was used due to its popularity. This article reports the electrical characteristics of normally off p-GaN gate AlGaN/GaN high-electron-mobility transistors (HEMTs) on low resistivity SiC substrate compared with the traditional Si substrate. The p-GaN HEMTs on SiC substrate possess several advantages, including electrical characteristic and good qualities of epitaxial crystals, especially on temperature performance. Additionally, the price of low resistivity SiC substrate is three times lower than the ordinary SiC substrate.

原文英語
主出版物標題CS MANTECH 2021 - 2021 International Conference on Compound Semiconductor Manufacturing Technology, Digest of Papers
發行者CS Mantech
頁面97-100
頁數4
ISBN(電子)9781893580312
出版狀態已出版 - 2021
事件35th Annual International Conference on Compound Semiconductor Manufacturing Technology, CS MANTECH 2021 - Orlando, Virtual, 美國
持續時間: 24 05 202127 05 2021

出版系列

名字CS MANTECH 2021 - 2021 International Conference on Compound Semiconductor Manufacturing Technology, Digest of Papers

Conference

Conference35th Annual International Conference on Compound Semiconductor Manufacturing Technology, CS MANTECH 2021
國家/地區美國
城市Orlando, Virtual
期間24/05/2127/05/21

文獻附註

Publisher Copyright:
© 2021 CS MANTECH 2021 - 2021 International Conference on Compound Semiconductor Manufacturing Technology, Digest of Papers. All Rights Reserved.

UN SDG

此研究成果有助於以下永續發展目標

  1. SDG9 工業、創新基礎建設
    SDG9 工業、創新基礎建設

指紋

深入研究「High Thermal Dissipation of Normally off p-GaN Gate AlGaN/GaN HEMTs on 6-inch N-doped Low Resistivity SiC Substrate」主題。共同形成了獨特的指紋。

引用此