摘要
Efficient heat removal through the substrate is required in high-power operation of AlGaN/GaN high-electron-mobility transistors (HEMTs). Thus, an SiC substrate was used due to its popularity. This article reports the electrical characteristics of normally off p-GaN gate AlGaN/GaN high-electron-mobility transistors (HEMTs) on low resistivity SiC substrate compared with the traditional Si substrate. The p-GaN HEMTs on SiC substrate possess several advantages, including electrical characteristic and good qualities of epitaxial crystals, especially on temperature performance. Additionally, the price of low resistivity SiC substrate is three times lower than the ordinary SiC substrate.
| 原文 | 英語 |
|---|---|
| 主出版物標題 | CS MANTECH 2021 - 2021 International Conference on Compound Semiconductor Manufacturing Technology, Digest of Papers |
| 發行者 | CS Mantech |
| 頁面 | 97-100 |
| 頁數 | 4 |
| ISBN(電子) | 9781893580312 |
| 出版狀態 | 已出版 - 2021 |
| 事件 | 35th Annual International Conference on Compound Semiconductor Manufacturing Technology, CS MANTECH 2021 - Orlando, Virtual, 美國 持續時間: 24 05 2021 → 27 05 2021 |
出版系列
| 名字 | CS MANTECH 2021 - 2021 International Conference on Compound Semiconductor Manufacturing Technology, Digest of Papers |
|---|
Conference
| Conference | 35th Annual International Conference on Compound Semiconductor Manufacturing Technology, CS MANTECH 2021 |
|---|---|
| 國家/地區 | 美國 |
| 城市 | Orlando, Virtual |
| 期間 | 24/05/21 → 27/05/21 |
文獻附註
Publisher Copyright:© 2021 CS MANTECH 2021 - 2021 International Conference on Compound Semiconductor Manufacturing Technology, Digest of Papers. All Rights Reserved.
UN SDG
此研究成果有助於以下永續發展目標
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SDG9 工業、創新基礎建設
指紋
深入研究「High Thermal Dissipation of Normally off p-GaN Gate AlGaN/GaN HEMTs on 6-inch N-doped Low Resistivity SiC Substrate」主題。共同形成了獨特的指紋。引用此
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