Influence of postdeposition annealing on physical and electrical properties of high-k Yb2TiO5 gate dielectrics

Tung Ming Pan*, Li Chen Yen, Chien Hung Chiang, Tien Sheng Chao

*此作品的通信作者

研究成果: 圖書/報告稿件的類型會議稿件同行評審

指紋

深入研究「Influence of postdeposition annealing on physical and electrical properties of high-k Yb2TiO5 gate dielectrics」主題。共同形成了獨特的指紋。

Biochemistry, Genetics and Molecular Biology

Material Science