Investigation of temperature dependent threshold voltage variation of Gd2O3/AlGaN/GaN metal-oxide-semiconductor heterostructure

Atanu Das, Liann Be Chang*, Ray Ming Lin

*此作品的通信作者

研究成果: 期刊稿件文章同行評審

15 引文 斯高帕斯(Scopus)

摘要

Temperature dependent threshold voltage (Vth) variation of GaN/AlGaN/Gd2O3/Ni-Au structure is investigated by capacitance-voltage measurement with temperature varying from 25°C to 150°C. The Vth of the Schottky device without oxide layer is slightly changed with respect to temperature. However, variation of V th is observed for both as-deposited and annealed device owing to electron capture by the interface traps or bulk traps. The Vth shifts of 0.4V and 3.2V are obtained for as-deposited and annealed device respectively. For annealed device, electron capture process is not only restricted in the interface region but also extended into the crystalline Gd2O3 layer through Frenkel-Poole emission and hooping conduction, resulting in a larger Vth shift. The calculated trap density for as-deposited and annealed device is 3.28×1011 ∼1.12×1011 eV-1 cm-2 and 1.74×1012 ∼7.33×1011 eV-1 cm-2 respectively in measured temperature range. These results indicate that elevated temperature measurement is necessary to characterize GaN/AlGaN heterostructure based devices with oxide as gate dielectric.

原文英語
文章編號032159
期刊AIP Advances
2
發行號3
DOIs
出版狀態已出版 - 09 2012

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