Modeling ferroelectric capacitors for memory applications

Xiao Hong Du*, Bing Sheu

*此作品的通信作者

研究成果: 期刊稿件文章同行評審

9 引文 斯高帕斯(Scopus)

摘要

The modeling of ferroelectric capacitors for memory applications is discussed. Ferroelectric random access memory (FRAM) is a nonvolatile memory that features fast read/write operations and low-power, battery-packed SRAM. The FRAM cell stores data in a capacitor that uses ferroelectric film as dielectric material. The modeling of ferroelectric capacitor is to efficiently record the history of the capacitor and to accurately determine the next value of the polarization form its history, the current state and the trend to the applied voltage.

原文英語
頁(從 - 到)10-16
頁數7
期刊IEEE Circuits and Devices Magazine
18
發行號6
DOIs
出版狀態已出版 - 11 2002
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