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Nickel exposure and plasma levels of biomarkers for assessing oxidative stress in nickel electroplating workers

  • Yu Chung Tsao
  • , Po Wen Gu
  • , Su Hsun Liu
  • , I. Shiang Tzeng
  • , Jau Yuan Chen
  • , Jiin Chyuan John Luo*
  • *此作品的通信作者
  • Chang Gung Memorial Hospital
  • Chang Gung University
  • National Taiwan University

研究成果: 期刊稿件文章同行評審

24 引文 斯高帕斯(Scopus)

摘要

Context: The mechanism of nickel-induced pathogenesis remains elusive. Objective: To examine effects of nickel exposure on plasma oxidative and anti-oxidative biomarkers. Materials and methods: Biomarker data were collected from 154 workers with various levels of nickel exposure and from 73 controls. Correlations between nickel exposure and oxidative and anti-oxidative biomarkers were determined using linear regression models. Results: Workers with a exposure to high nickel levels had significantly lower levels of anti-oxidants (glutathione and catalase) than those with a lower exposure to nickel; however, only glutathione showed an independent association after multivariable adjustment. Discussion and conclusion: Exposure to high levels of nickel may reduce serum anti-oxidative capacity.

原文英語
頁(從 - 到)455-460
頁數6
期刊Biomarkers
22
發行號5
DOIs
出版狀態已出版 - 04 07 2017

文獻附註

Publisher Copyright:
© 2016 Informa UK Limited, trading as Taylor & Francis Group.

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