@conference{dfcd5324193d4cd2b3fcfaba4ba25ddf,
title = "Novel Dynamic Threshold Voltage Contact Etching Stop Layer (DT-CESL) Strained HfO2 nMOSFET for Very Low Voltage Operation (0.7V)",
author = "Woei-Cherng Wu and Tien-Sheng Chao and Kuan-Ti Wang and Shih-Ching Lee and Te-Hsin Chiu and Tsung-Yi Lu and Chao-Sung Lai and Jer-Chyi Wang and Ming-Wen Ma and Kuo-Hsing Kao and Wen-Cheng Lo",
year = "2009",
language = "American English",
note = "2009 International Conference on Solid State Devices and Materials (SSDM 2009) ; Conference date: 07-10-2009 Through 09-10-2009",
}