On chip surge protection for GaN-power LEDs by ZnO thin film varistor

Liann Be Chang*, Yuan Hsiao Chang, Yuan Shun Chang, Ming Jer Jeng

*此作品的通信作者

研究成果: 圖書/報告稿件的類型會議稿件同行評審

1 引文 斯高帕斯(Scopus)

摘要

High ESD endurance capability is an important issue for the extensive application of power light emitting diodes (LEDs). Conventional ceramic varistor based on sintered bulk zinc oxide (ZnO) with various metal oxides as additives have widely used in surge protection device by grounding the excessive current for a long time. Those sintered bulk ZnO devices are known to exhibit high nonlinearity coefficient (α>50) and good reliability for many commercial applications. However, sintering manufacture method limits the practicability of integrating bulk ZnO varistor with other semiconductor devices. In this research, we report on the thin-film ZnO produced by sputtering system and post-heat treatment which have shown good varistor characteristics. The nonlinear coefficients (α) in the correspondent current -voltage (I-V) curve can up to 50 at a high electric field of 1.1 kV/cm, and, with efficiently resolving thermal generated by high injected current, this thin film varistor can conduct current to the density as high as 20A/cm2 successfully. In addition, our thin film varistor devices combined with power LEDs by gold wires bonding revealed an improved electrostatic discharge (ESD) ability of up to 400V apparently. This wire bonding configuration will be modified to a flip-chip LED with the ZnO/Si submount in the future. Sputtering and annealing are two commonly used processes in general semiconductor manufacture procedures which are adopted in our ZnO thin film deposition. Therefore, our proposed method have provided a new possible solution to integrate not only LEDs but also other semiconductor devices with thin film varistor owning surge protection capability, especially to accomplish an on-chip surge protection.

原文英語
主出版物標題Gallium Nitride Materials and Devices III
DOIs
出版狀態已出版 - 2008
事件Society of Photo-Optical Instrumentation Engineers (SPIE) - San Jose, CA, 美國
持續時間: 21 01 200824 01 2008

出版系列

名字Proceedings of SPIE - The International Society for Optical Engineering
6894
ISSN(列印)0277-786X

Conference

ConferenceSociety of Photo-Optical Instrumentation Engineers (SPIE)
國家/地區美國
城市San Jose, CA
期間21/01/0824/01/08

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