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Optical recombination-emission characteristics and surface morphologies of InAs quantum dots grown on misoriented GaAs substrate by MOCVD

  • M. Y. Hsu
  • , S. F. Tang*
  • , C. D. Chiang
  • , C. C. Su
  • , L. C. Wang
  • , C. T. Kuo
  • *此作品的通信作者
  • National Taipei University of Technology
  • Chung-shan Institute of Science and Technology Taiwan
  • National Yang Ming Chiao Tung University

研究成果: 期刊稿件 › 會議文章 › 同行評審

2 引文 斯高帕斯(Scopus)

摘要

The InAs quantum dot (QD) structures grown on (100) 2°, 6°, 10°, 15° off-angles to (111)A GaAs substrate have been investigated by atomic force microscopy (AFM) and cryogenic photoluminescence (PL). The exact-angle InAs/GaAs is used as the reference sample. The blue shift of PL peak spectra with increasing misoriented scales has also been observed experimentally. In this work, we demonstrated that different off-angle substrates would influence the distribution and uniformity of QD due to variant surface potential energies, which are responsible for the two-stage process (migration and nucleation) of InAs adatoms on the off-angle substrates.

原文英語
頁(從 - 到)183-187
頁數5
期刊Thin Solid Films
卷498
發行號1-2
DOIs
出版狀態已出版 - 01 03 2006
對外發佈是
事件Proceedings of the Third Asian Conference on Chemical Vapor Deposition (Third Asian-CVD), Third Asian CVD -
持續時間: 12 11 2004 → 14 11 2004

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