跳至主導覽
跳至搜尋
跳過主要內容
長庚大學學術能量集萃 首頁
說明與常見問題
English
中文
首頁
學者概覽
研究單位
研究產出
研究計畫-專案
獎項
活動
新聞/媒體
按專業知識、姓名或所屬機構搜尋
Optoelectronic properties of sputter-deposited Cu
2
O-Ag-Cu
2
O treated with rapid thermal annealing
P. W. Kuo, J. H. Hsieh
*
, W. T. Wu, C. H. Wu
*
此作品的通信作者
National Chung Hsing University
Ming Chi University of Technology
National Taiwan Ocean University
研究成果
:
期刊稿件
›
文章
›
同行評審
3
引文 斯高帕斯(Scopus)
總覽
指紋
指紋
深入研究「Optoelectronic properties of sputter-deposited Cu
2
O-Ag-Cu
2
O treated with rapid thermal annealing」主題。共同形成了獨特的指紋。
排序方式
重量
按字母排序
Engineering
Properties
100%
Rapid Thermal Annealing
100%
Annealing
66%
Measurement System
66%
Glass Substrate
33%
Thin Films
33%
Transforms
33%
Forming
33%
Transmissions
33%
Light Absorption
33%
Annealing Temperature
33%
Magnetron
33%
Ar Atmosphere
33%
Optical Transmission
33%
Tension Surface
33%
Mass Thickness
33%
Photometer
33%
Individual Particle
33%
Material Science
Annealing
100%
Particle
100%
Optoelectronics
100%
Electrical Resistivity
66%
Glass
33%
Temperature
33%
Film
33%
Magnetron Sputtering
33%
Thin Films
33%
Electrical Property
33%
Optical Property
33%
Protective Atmosphere
33%
Surface Tension
33%
Physics
Particle
100%
Annealing
100%
Electrical Resistivity
66%
Substrates
33%
Temperature
33%
Deposition
33%
Region
33%
Thin Films
33%
Glass
33%
Optical Properties
33%
Magnetron Sputtering
33%
Electrical Properties
33%
Photometer
33%
Electromagnetic Absorption
33%
Planetary Atmosphere
33%