Oxygen Plasma Immersion Ion Implantation Treatment to Enhance Data Retention of Tungsten Nanocrystal Nonvolatile Memory

研究成果: 會議稿件的類型 › 會議論文

原文	美式英語
出版狀態	已出版 - 2013
事件	The 12th International Symposium on Sputtering & Plasma Processes (ISSP2013) - Kyoto, Japan 持續時間: 10 07 2013 → 12 07 2013

Conference	The 12th International Symposium on Sputtering & Plasma Processes (ISSP2013)
期間	10/07/13 → 12/07/13

引用此

@conference{b35838723b5e4a14bd4be6bc2dd9813d,

title = "Oxygen Plasma Immersion Ion Implantation Treatment to Enhance Data Retention of Tungsten Nanocrystal Nonvolatile Memory",

author = "Jer-Chyi Wang",

year = "2013",

language = "American English",

note = "The 12th International Symposium on Sputtering & Plasma Processes (ISSP2013) ; Conference date: 10-07-2013 Through 12-07-2013",

}