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Resistive switching memory and artificial synapse by using Ti/MoS2 based conductive bridging cross-points

  • Mrinmoy Dutta
  • , Asim Senapati
  • , Sreekanth Ginnaram
  • , Siddheswar Maikap*
  • *此作品的通信作者
  • Chang Gung University
  • Chang Gung Memorial Hospital

研究成果: 期刊稿件 › 文章 › 同行評審

27 引文 斯高帕斯(Scopus)

摘要

The Ti/MoS2 based 9 × 9 conductive bridge cross-points in Al/Cu/Ti/MoS2/Pt structure and its suitability in brain-inspired neuromorphic application have been investigated. Repeatable forming-free multilevel switching cycles with the low current compliances (CCs) of 10 μA–300 μA and long program/erase (P/E) endurance of >7 × 108 with low P/E current of 10 μA/100 μA at a high-speed of 100 ns have been obtained than pure MoS2 based devices. Copper reduction-oxidation (redox) reaction associated resistive switching mechanism through cyclic-voltammetry is also investigated. Conductivity modulated potentiation and depression results as well as LTP/LTD characteristics have been explored. Significantly low energy consumption in between 17 fJ to 398 fJ has been obtained.

原文英語
文章編號109326
期刊Vacuum
卷176
DOIs
出版狀態已出版 - 06 2020

文獻附註

Publisher Copyright:
© 2020 Elsevier Ltd

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