摘要
Si/Si1-x-yGexCy/Si quantum well heterostructures grown by UH CVD have been characterized in terms of structural and optical properties. The Schottky barrier height (SBH) and ideality factor (n) of PtSi/p-Si1-x-yGexCy/Si diodes have been investigated using the currentvoltage (I-V) characteristics. The valence band offsets (ΔEv) of Si/Si0.795Ge0.2C0.005 and Si/ Si0.79Ge0.2C0.01have been extracted using the Schottky diode measurements. A lower value of SBH (φb) has been observed in the ternary alloy compared to those in fully strained-Si1-xGex films (with same lattice mismatch to Si) indicating the potential of former for long wavelength IR detection
| 原文 | 英語 |
|---|---|
| 頁(從 - 到) | 366-371 |
| 頁數 | 6 |
| 期刊 | Proceedings of SPIE - The International Society for Optical Engineering |
| 卷 | 4417 |
| DOIs | |
| 出版狀態 | 已出版 - 2001 |
| 對外發佈 | 是 |
指紋
深入研究「Schottky diode on Si/Si1-x-yGexCy/Si quantum well heterostructures for long wavelength IR detector」主題。共同形成了獨特的指紋。引用此
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