Self-aligned gate dielectric in carbon nanotube field-effect transistors by anodic oxidation of aluminium

Jeff T.H. Tsai, Wei Syun Wang, Szu Hung Chen, Chia Liang Sun

研究成果: 期刊稿件文章同行評審

2 引文 斯高帕斯(Scopus)

摘要

We demonstrate a process of fabricating carbon nanotube field-effect transistors with self-aligned gate insulators by anodic oxidation of aluminium. We use rapid thermal annealed multi-walled carbon nanotubes (CNTs) as the active material overlaid across an aluminium gate. The porous nanotube bundles allowed moisture from the air to penetrate, and oxidise the aluminium by anodic oxidation to construct a self-assembled aluminium oxide in the area where the CNTs were overlaid. Electron dispersive spectroscopy analysis of this oxidised surface confirmed the formation of self-aligned Al2O3. The metal-oxide-carbon nanotube transistors were compared to conventional nanotube transistors which have silicon dioxide as the gate insulator. Our results show that the self-aligned gate insulator produced by the anodic oxidisation of aluminium had better transistor performance. This is a promising process for the fabrication of nano-transistors in which embedded nanowires or nanotubes are the functional material in field-effect transistor applications.

原文英語
頁(從 - 到)138-144
頁數7
期刊Journal of Experimental Nanoscience
8
發行號2
DOIs
出版狀態已出版 - 02 2013

指紋

深入研究「Self-aligned gate dielectric in carbon nanotube field-effect transistors by anodic oxidation of aluminium」主題。共同形成了獨特的指紋。

引用此