Structural and Electrical Characteristics of Alternative High-k Dielectrics for CMOS Applications

Fu Chien Chiu; Somnath Mondal; Tung Ming Pan

doi:10.1002/9783527646340.ch5

Structural and Electrical Characteristics of Alternative High-k Dielectrics for CMOS Applications

Fu Chien Chiu^*, Somnath Mondal, Tung Ming Pan

^*此作品的通信作者

電子工程學系(含學碩博士班)

研究成果: 圖書/報告稿件的類型 › 章節 › 同行評審

11 引文斯高帕斯（Scopus）

原文	英語
主出版物標題	High-k Gate Dielectrics for CMOS Technology
發行者	Wiley-VCH
頁面	111-184
頁數	74
ISBN（列印）	9783527330324
DOIs	https://doi.org/10.1002/9783527646340.ch5
出版狀態	已出版 - 23 08 2012

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10.1002/9783527646340.ch5

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引用此

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title = "Structural and Electrical Characteristics of Alternative High-k Dielectrics for CMOS Applications",

keywords = "Atomic force microscopy, High permittivity dielectric (high-k), Rare-earth oxide, Transmission electron microscope, X-ray diffraction, X-ray photoelectron spectroscopy",

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