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The behavior of cyclic voltammetry stripping (CVs) with tin-doped indium oxide in 0.3M hydrochloric acid

  • K. C. Li*
  • , C. A. Huang
  • , G. C. Tu
  • , W. S. Wang
  • *此作品的通信作者
  • Chang Gung University
  • National Yang Ming Chiao Tung University

研究成果: 期刊稿件 › 會議文章 › 同行評審

4 引文 斯高帕斯(Scopus)

摘要

The cyclic voltammetry stripping (CVs) behavior of the tin-doped indium oxide (ITO) on SiO2 in 0.3M HCl is reported. The CVs result showed an obvious reduction-current peak that occurred during the first cathodic potential scanning. Smaller reduction current and more negative potential of the reduction-current peak were also observed for the ITO that was annealed at 500 °C. The result was attributed to the replenished oxygen-deficient site and the oxygen anion density is decreased in the ITO. The present study has proved that CVs is a useful method to differentiate the carrier concentration in ITO film controlled by different pretreatments. Many spherical In-Sn particles were formed on the ITO when the reduction current took place. During precipitation of these spherical particles, the grain boundaries of the ITO were dissolved and the ITO surface nearby the grain boundaries offered a preferred nucleation site for the formation of these spherical In-Sn particles. Based on the microstructure observed and the result derived from the short potential range scanning, the formation mechanism of the spherical particle is proposed.

原文英語
頁(從 - 到)193-199
頁數7
期刊Materials Research Society Symposium - Proceedings
卷747
出版狀態已出版 - 2003
事件Crystalline Oxide-Silicon Heterostructures and Oxide Optoelectronics - Boston, MA, 美國
持續時間: 02 12 2002 → 04 12 2002

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