The deposition and microstructure of amorphous tungsten oxide films by sputtering

Physics

• Deposition 100%
• Tungsten 100%
• Sputtering 100%
• Oxygen 100%
• Flow Velocity 80%
• Oxide 40%
• Metal 40%
• X Ray Spectroscopy 40%
• Spectrometer 40%
• Colour 40%
• Independent Variables 20%
• Gaps 20%
• Ion 20%
• Scanning Electron Microscopy 20%
• Targets 20%
• X Ray Diffraction 20%
• Spectroscopy 20%
• Electric Potential 20%
• Electrons 20%
• Darkness 20%
• Existence 20%
• Light Emission 20%
• Electrostatic Probe 20%

Material Science

• Amorphous Material 100%
• Microstructure 100%
• Sputtering 100%
• Tungsten 100%
• Metal 50%
• Oxide 50%
• Color 50%
• X-Ray Diffraction 25%
• Scanning Electron Microscopy 25%
• Absorbance 25%
• Energy-Dispersive X-Ray Spectroscopy 25%
• Electrochromics 25%
• Probe 25%
• Near Infrared Spectroscopy 25%

Chemistry

• Liquid Film 100%
• Microstructure 100%
• Sputtering 100%
• Tungsten Oxide 100%
• Dioxygen 41%
• Flow Kinetics 33%
• Metal 16%
• Phase Composition 16%
• Color 16%
• Sample 8%
• Oxide 8%
• Voltage 8%
• Electron Particle 8%
• Ion 8%
• Scanning Electron Microscopy 8%
• UV/VIS Spectroscopy 8%
• Band Gap 8%
• Deposition Process 8%
• Tungsten 8%
• Amorphous Structure 8%
• Dark Blue 8%
• Vis-NIR Spectroscopy 8%
• Plasma 8%