The field emission characteristics of carbon nanotubes coated by boron nitride film

C. Y. Su; Z. Y. Juang; Y. L. Chen; K. C. Leou; C. H. Tsai

doi:10.1016/j.diamond.2006.11.090

The field emission characteristics of carbon nanotubes coated by boron nitride film

C. Y. Su, Z. Y. Juang^*, Y. L. Chen, K. C. Leou, C. H. Tsai

^*此作品的通信作者

National Tsing Hua University

研究成果: 期刊稿件 › 文章 › 同行評審

28 引文斯高帕斯（Scopus）

摘要

The field emission (FE) characteristics of boron nitride (BN) film deposition on the individual and vertically aligned carbon nanotube (CNT) were investigated. In this work, the CNTs were deposited with BN film by both magnetron sputtering and plasma-assisted chemical vapor deposition (PACVD) methods. The field emission (FE) characteristics measured after the BN film deposition revealed that the turn-on field was significantly reduced and the maximum emission current increased by two orders of magnitude higher than that of bare CNT with a proper deposition thickness. The experimental results show that with different deposited conditions, the thickness has significant effects on the FE characteristics. In addition, from the measured turn-on filed and as defined field enhancement factor, CNTs with sputter-deposited BN film demonstrated better FE performance than those with BN deposited by PACVD.

原文	英語
頁（從 - 到）	1393-1397
頁數	5
期刊	Diamond and Related Materials
卷	16
發行號	4-7 SPEC. ISS.
DOIs	https://doi.org/10.1016/j.diamond.2006.11.090
出版狀態	已出版 - 04 2007
對外發佈	是

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title = "The field emission characteristics of carbon nanotubes coated by boron nitride film",

abstract = "The field emission (FE) characteristics of boron nitride (BN) film deposition on the individual and vertically aligned carbon nanotube (CNT) were investigated. In this work, the CNTs were deposited with BN film by both magnetron sputtering and plasma-assisted chemical vapor deposition (PACVD) methods. The field emission (FE) characteristics measured after the BN film deposition revealed that the turn-on field was significantly reduced and the maximum emission current increased by two orders of magnitude higher than that of bare CNT with a proper deposition thickness. The experimental results show that with different deposited conditions, the thickness has significant effects on the FE characteristics. In addition, from the measured turn-on filed and as defined field enhancement factor, CNTs with sputter-deposited BN film demonstrated better FE performance than those with BN deposited by PACVD.",

keywords = "Boron nitride, Carbon nanotubes, Field emission, PACVD, Raman spectroscopy, Turn-on field",

author = "Su, {C. Y.} and Juang, {Z. Y.} and Chen, {Y. L.} and Leou, {K. C.} and Tsai, {C. H.}",

year = "2007",

month = apr,

doi = "10.1016/j.diamond.2006.11.090",

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journal = "Diamond and Related Materials",

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AU - Su, C. Y.

AU - Juang, Z. Y.

AU - Chen, Y. L.

AU - Leou, K. C.

AU - Tsai, C. H.

PY - 2007/4

Y1 - 2007/4

N2 - The field emission (FE) characteristics of boron nitride (BN) film deposition on the individual and vertically aligned carbon nanotube (CNT) were investigated. In this work, the CNTs were deposited with BN film by both magnetron sputtering and plasma-assisted chemical vapor deposition (PACVD) methods. The field emission (FE) characteristics measured after the BN film deposition revealed that the turn-on field was significantly reduced and the maximum emission current increased by two orders of magnitude higher than that of bare CNT with a proper deposition thickness. The experimental results show that with different deposited conditions, the thickness has significant effects on the FE characteristics. In addition, from the measured turn-on filed and as defined field enhancement factor, CNTs with sputter-deposited BN film demonstrated better FE performance than those with BN deposited by PACVD.

AB - The field emission (FE) characteristics of boron nitride (BN) film deposition on the individual and vertically aligned carbon nanotube (CNT) were investigated. In this work, the CNTs were deposited with BN film by both magnetron sputtering and plasma-assisted chemical vapor deposition (PACVD) methods. The field emission (FE) characteristics measured after the BN film deposition revealed that the turn-on field was significantly reduced and the maximum emission current increased by two orders of magnitude higher than that of bare CNT with a proper deposition thickness. The experimental results show that with different deposited conditions, the thickness has significant effects on the FE characteristics. In addition, from the measured turn-on filed and as defined field enhancement factor, CNTs with sputter-deposited BN film demonstrated better FE performance than those with BN deposited by PACVD.

KW - Boron nitride

KW - Carbon nanotubes

KW - Field emission

KW - PACVD

KW - Raman spectroscopy

KW - Turn-on field

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The field emission characteristics of carbon nanotubes coated by boron nitride film

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